Sivusto ei tue käyttämääsi selainta. Suosittelemme selaimen päivittämistä uudempaan versioon.
  • May 2024. Successful manufacturing and testing of a thin-film device using our patterning equipment.
  • October 2023. Successful direct-patterning test at ORNL by the jointly developed patterning instrument.
  • April 2022. Third-part validation of the direct-writing patterning of our material.
  • February 2022. Computer code for simulating the impact of disorder - e.g., dislocations, point defects, strain - on x-ray diffraction intensities.
  • December 2019. Strong Ferromagnetic Double Layer Structure for Handheld Electronics.
  • September 2019. Rare-Earth-Free Magnetic Thin Films from Common and Affordable Elements for Semiconductor Industry by Advanced Manufacturing.