- May 2024. Successful manufacturing and testing of a thin-film device using our patterning equipment.
- October 2023. Successful direct-patterning test at ORNL by the jointly developed patterning instrument.
- April 2022. Third-part validation of the direct-writing patterning of our material.
- February 2022. Computer code for simulating the impact of disorder - e.g., dislocations, point defects, strain - on x-ray diffraction intensities.
- December 2019. Strong Ferromagnetic Double Layer Structure for Handheld Electronics.
- September 2019. Rare-Earth-Free Magnetic Thin Films from Common and Affordable Elements for Semiconductor Industry by Advanced Manufacturing.